TU3.R3.2
A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Farnaz Tabarkhoon, Mohammad Bazmi, Nicholas A. Welchert, Theo Tsotsis, Malancha Gupta, University of Southern California
Session:
TU3.R3: Reaction Engineering for Materials Synthesis
Track:
Reaction Engineering for Materials Synthesis
Location:
Tanglewood/Bellaire
Presentation Time:
Tue, 18 Feb, 16:10 - 16:30 CT (UTC -5)
Session Co-Chairs:
Jeremy Bedard, Oxy and Nicholas Thornburg, National Renewable Energy Laboratory
Presentation
Discussion
Resources
No resources available.
Session TU3.R3
TU3.R3.1: MECHANISTIC INSIGHTS INTO METAL-ORGANIC FRAMEWORK FORMATION FROM IN-SITU X-RAY SCATTERING DATA
Gaurav Giri, University of Virginia
TU3.R3.2: A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Farnaz Tabarkhoon, Mohammad Bazmi, Nicholas A. Welchert, Theo Tsotsis, Malancha Gupta, University of Southern California
TU3.R3.3: Synthesis of Brightly Fluorescent ZnSe Quantum Dots using Air-Stable Precursors
Ali Rad, Haley Keister, Ioannis Mountziaris, Francisco Robles-Hernandez, Triantafillos Mountziaris, University OF Houston
Contacts