WE2.R3.2
A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Farnaz Tabarkhoon, Mohammad Bazmi, Nicholas A. Welchert, Theo Tsotsis, Malancha Gupta, University of Southern California, United States
Session:
WE2.R3: Reaction Engineering for Materials Synthesis
Track:
Reaction Engineering for Materials Synthesis
Location:
Room 3
Presentation Time:
Wed, 19 Feb, 11:05 - 11:25 CT (UTC -6)
Presentation
Discussion
Resources
No resources available.
Session WE2.R3
WE2.R3.1: Keynote
WE2.R3.2: A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Farnaz Tabarkhoon, Mohammad Bazmi, Nicholas A. Welchert, Theo Tsotsis, Malancha Gupta, University of Southern California, United States
WE2.R3.3: Synthesis of Brightly Fluorescent ZnSe Quantum Dots using Air-Stable Precursors
Ali Rad, Haley Keister, Ioannis Mountziaris, Francisco Robles-Hernandez, Triantafillos Mountziaris, University OF Houston, United States
Contacts