TU3.R3: Reaction Engineering for Materials Synthesis
Tue, 18 Feb, 15:50 - 16:50 CT (UTC -6)
Location: Tanglewood/Bellaire
Session Type: Oral
Track: Reaction Engineering for Materials Synthesis
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Tue, 18 Feb, 16:10 - 16:30 CT (UTC -6)
TU3.R3.2: A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Tue, 18 Feb, 16:30 - 16:50 CT (UTC -6)