WE2.R3: Reaction Engineering for Materials Synthesis
Wed, 19 Feb, 10:45 - 11:45 CT (UTC -6)
Location: Room 3
Session Type: Oral
Track: Reaction Engineering for Materials Synthesis
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Wed, 19 Feb, 11:05 - 11:25 CT (UTC -6)
WE2.R3.2: A NOVEL PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) REACTOR SYSTEM FOR FABRICATION OF SIC-TYPE CERAMIC FILMS AND MEMBRANES
Wed, 19 Feb, 11:25 - 11:45 CT (UTC -6)